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Tungsten Sputtering Targets

Tungsten Sputtering Targets High purity tungste targets with full density and homogeneous texture,high utilization rate and greater efficiency


Tungsten Sputtering Targets

Experiencing equally rapid growth is the market for sputtering targets, which are used in a wide variety of applications, including data storage, fiber optics, flat panel displays, large area coating, and semiconductors. Our vertical integration, from basic material to finished plates, and our understanding of the technical issues facing the market, brings added value to sputtering target OEMs. One of our primary strengths is development and processing of the materials. We are experts at controlling material characteristics such as grain size, texture, and purity, not just from lot to lot, but also from plate to plate. From start to finish, we work with customers to meet their specific needs, whether that means developing special alloys or engineering alternative shapes, such as tubes, cylinders, and other complex shapes.

Tungsten layers are components of the thin-film transistors used in TFT-LCD screens. They are used wherever large screen formats, particularly high image definition and optimized contrasts are needed. But tungsten is also used as a diffusion barrier and a conductive connector in the microelectronics industry.

At high temperatures, thin films made of materials with low melting points may diffuse and intermix with the adjacent layers. This does not happen with tungsten. This material has the highest melting point of all metals – as a result, tungsten layers are particularly stable.

Using the world's largest hot rolling mill for refractory metals, we recently succeeded in manufacturing the largest tungsten sputtering target on Earth. The benefit to you of our large formats: The coating process is more stable and the deposited layers are of higher quality.


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